Radiation imagery chemistry: process – composition – or product th – Radiation modifying product or process of making – Radiation mask
Reexamination Certificate
2006-09-19
2006-09-19
Rosasco, S. (Department: 1756)
Radiation imagery chemistry: process, composition, or product th
Radiation modifying product or process of making
Radiation mask
Reexamination Certificate
active
07108945
ABSTRACT:
A photomask has a device pattern, which has an opening portion and a mask portion, and either a focus monitor pattern or an exposure dose monitor pattern, which has an opening portion and a mask portion and which has the same plane pattern shape as at least a partial region of a device pattern. The phase difference in transmitted exposure light between the opening portion and the mask portion of the focus monitor pattern is different from that between the opening portion and the mask portion of the device pattern. The opening portion of the exposure dose monitor pattern has a different exposure dose transmittance from that of the opening portion of the device pattern.
REFERENCES:
patent: 5300786 (1994-04-01), Brunner et al.
patent: 6376139 (2002-04-01), Fujisawa et al.
patent: 6440616 (2002-08-01), Izuha et al.
patent: 2002/0100012 (2002-07-01), Sutani et al.
patent: 2002/0182521 (2002-12-01), Fujisawa et al.
patent: 2539163 (1996-07-01), None
patent: 9-329889 (1997-12-01), None
patent: 2803963 (1998-07-01), None
patent: 2000-310850 (2000-11-01), None
patent: 2001-189264 (2001-07-01), None
Notice of Grounds for Rejection issued by the Japanese Patent Office, mailed Feb. 21, 2006, for Japanese Patent Application No. 2002-090010, and English-language translation thereof.
Fujisawa Tadahito
Inoue Soichi
Izuha Kyoko
Sutani Takumichi
Finnegan Henderson Farabow Garrett & Dunner L.L.P.
Kabushiki Kaisha Toshiba
Rosasco S.
LandOfFree
Photomask having a focus monitor pattern does not yet have a rating. At this time, there are no reviews or comments for this patent.
If you have personal experience with Photomask having a focus monitor pattern, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Photomask having a focus monitor pattern will most certainly appreciate the feedback.
Profile ID: LFUS-PAI-O-3534634