Photomask for forming photoresist patterns repeating in two...

Details Photomask for forming photoresist patterns repeating in two... Photomask for forming photoresist patterns repeating in two...

2008-04-22

2008-04-22

Rosasco, S. (Department: 1795)

Radiation imagery chemistry: process, composition, or product th

Radiation modifying product or process of making

Radiation mask

Reexamination Certificate

active

07361433

ABSTRACT:
A photomask includes a transparent substrate, and a plurality of light-shielding patterns repeatedly aligned on the transparent substrate in two dimensions. Each of the light-shielding patterns has length and width measurements that differ from each other. Further, the photomask includes at least one through hole penetrating a portion of each of the light-shielding patterns to expose the transparent substrate.

REFERENCES:
patent: 5935734 (1999-08-01), Pierrat
patent: 6830852 (2004-12-01), Kawata et al.
patent: 6991896 (2006-01-01), Kawashima
patent: 7022438 (2006-04-01), Kim

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