4. Computer-aided design and analysis of circuits and semiconductor
  5. Design of semiconductor mask or reticle
  6. Analysis and verification

Young-Seog Kang

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Method of designing phase grating pattern providing modified...

Radiation imagery chemistry: process – composition – or product th – Radiation modifying product or process of making – Radiation mask
Reexamination Certificate

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Optical system for providing a hexapole illumination and...

Photocopying – Projection printing and copying cameras – Illumination systems or details
Reexamination Certificate

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Photomask for forming photoresist patterns repeating in two...

Radiation imagery chemistry: process – composition – or product th – Radiation modifying product or process of making – Radiation mask
Reexamination Certificate

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Photomask for forming photoresist patterns repeating in two...

Radiation imagery chemistry: process – composition – or product th – Radiation modifying product or process of making – Radiation mask
Reexamination Certificate

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System and method correcting optical proximity effect using...

Computer-aided design and analysis of circuits and semiconductor – Design of semiconductor mask or reticle – Analysis and verification
Reexamination Certificate

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Profile ID: LFUS-PAI-P-2229769

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