Photolithographic method using non-photoactive resins

Details Photolithographic method using non-photoactive resins Photolithographic method using non-photoactive resins

1992-12-16

1994-05-31

McCamish, Marion E.

Radiation imagery chemistry: process, composition, or product th

Imaging affecting physical property of radiation sensitive...

Making electrical device

430317, 430323, 430325, 430326, 430327, G03C 516

Patent

active

053168950

ABSTRACT:
A method for patterning an integrated circuit workpiece comprises depositing a layer of non-photoactive material on the wafer. A reagent is deposited onto the entire surface of the material. A pattern is then created by exposing the surface with an energy source which produces a reaction within the reagent and/or between the reagent and the resin. The unreacted reagent is then removed by either physical or chemical means. Finally, the unexposed material is removed by means of an etch.

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patent: 4921778 (1990-05-01), Thackeray et al.
Burggraaf, Pieter S., "Multilayer-Resist Lithography", Semiconductor International, Jun. 1983, pp. 48-55.
Roland, et al., "The Mechanism of the Desire Process", publication and date unknown.

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