Radiation imagery chemistry: process – composition – or product th – Imaging affecting physical property of radiation sensitive... – Making electrical device
Patent
1992-12-16
1994-05-31
McCamish, Marion E.
Radiation imagery chemistry: process, composition, or product th
Imaging affecting physical property of radiation sensitive...
Making electrical device
430317, 430323, 430325, 430326, 430327, G03C 516
Patent
active
053168950
ABSTRACT:
A method for patterning an integrated circuit workpiece comprises depositing a layer of non-photoactive material on the wafer. A reagent is deposited onto the entire surface of the material. A pattern is then created by exposing the surface with an energy source which produces a reaction within the reagent and/or between the reagent and the resin. The unreacted reagent is then removed by either physical or chemical means. Finally, the unexposed material is removed by means of an etch.
REFERENCES:
patent: 3847609 (1974-11-01), Breslow et al.
patent: 4612085 (1986-09-01), Jelks
patent: 4634644 (1987-01-01), Irving et al.
patent: 4751170 (1988-06-01), Mimura
patent: 4818665 (1989-04-01), Haruta et al.
patent: 4826564 (1989-05-01), Desilets
patent: 4921778 (1990-05-01), Thackeray et al.
Burggraaf, Pieter S., "Multilayer-Resist Lithography", Semiconductor International, Jun. 1983, pp. 48-55.
Roland, et al., "The Mechanism of the Desire Process", publication and date unknown.
Donaldson Richard L.
Duda Kathleen
Kesterson James C.
Matsil Ira S.
McCamish Marion E.
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