Photolithographic etching process using organosilicon polymer co

Details Photolithographic etching process using organosilicon polymer co Photolithographic etching process using organosilicon polymer co

1986-11-07

1987-09-15

Brammer, Jack P.

Radiation imagery chemistry: process, composition, or product th

Imaging affecting physical property of radiation sensitive...

Forming nonplanar surface

430 5, 430281, 430312, 430314, 430325, 430918, 528 32, 522 99, G03C 500

Patent

active

046939601

ABSTRACT:
A composition containing a polysiloxane having a polymerizable ethylenically unsaturated group, and 2,2-dimethoxy-2-phenyl acetophenone as an ultraviolet light sensitizer; and use thereof in lithography.

REFERENCES:
patent: 3696068 (1972-10-01), Creamer
patent: 4052529 (1977-10-01), Bokerman et al.
patent: 4208471 (1980-06-01), Bresak et al.
patent: 4491508 (1985-01-01), Olson et al.
patent: 4539357 (1985-09-01), Bobear

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