Radiation imagery chemistry: process – composition – or product th – Imaging affecting physical property of radiation sensitive... – Radiation sensitive composition or product or process of making
Patent
1993-04-30
1994-11-29
Bowers, Jr., Charles L.
Radiation imagery chemistry: process, composition, or product th
Imaging affecting physical property of radiation sensitive...
Radiation sensitive composition or product or process of making
430302, 430512, G03F 711
Patent
active
053689895
ABSTRACT:
A composition and a method for forming an anti-reflective layer for DUV microlithographic processes is disclosed. The compositions of the present invention includes a polymer dissolved in a suitable solvent. The polymers are polysulfone and polyurea polymers which possess inherent light absorbing properties at deep ultraviolet wavelengths. In accordance with the method of the present invention, these compositions are applied to a substrate to form an anti-reflective coating, and thereafter a photoresist material that is compatible with the anti-reflective coating is applied.
REFERENCES:
patent: 4910122 (1990-03-01), Arnold et al.
patent: 4950583 (1990-08-01), Brewer et al.
patent: 5057399 (1991-10-01), Flaim et al.
patent: 5110697 (1992-05-01), Lamb, III et al.
Brewer Terry
Flaim Tony D.
Lamb, III James E.
Moeckli Kimberly A.
Bowers Jr. Charles L.
Brewer Science Inc.
Peoples, Jr. Veo
Young Christopher G.
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