Photoinduced migration of silver into chalcogenide layer

Details Photoinduced migration of silver into chalcogenide layer Photoinduced migration of silver into chalcogenide layer

1979-05-04

1981-06-30

Kimlin, Edward C.

Radiation imagery chemistry: process, composition, or product th

Imaging affecting physical property of radiation sensitive...

Forming nonplanar surface

430270, 430275, 430313, 430317, 430318, 430321, 430325, 430327, 156643, 1566591, G03C 500

Patent

active

042763681

ABSTRACT:
Lithographic patterning of particular interest in fabrication of integrated circuitry is based on the photoinduced migration of silver into germanium selenide or other glassy material of appropriate absorption cross section for the chosen actinic radiation. Resists which are negative-acting yield high resolution attributed to initial introduction of the silver in chemically combined form chosen so as to result in formation of a silver compound with a glass component with the compound serving as silver source. Removal of excess silver-containing material is engineered on the basis of the form of silver introduction and results in conversion to a water soluble form. Commercial use will likely be based on an embodiment in which the now developed patterned resist serves as a dry etching mask during delineation of a relatively thick underlying layer of organic material. This procedure is particularly advantageous for use on partially processed circuitry in which prior operations have resulted in surface steps.

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