Radiation imagery chemistry: process – composition – or product th – Imaging affecting physical property of radiation sensitive... – Forming nonplanar surface
Patent
1989-08-11
1991-12-03
McCamish, Marion E.
Radiation imagery chemistry: process, composition, or product th
Imaging affecting physical property of radiation sensitive...
Forming nonplanar surface
430280, 430311, 522 31, 522137, 522170, G03F 7028
Patent
active
050700022
ABSTRACT:
Compositions which include an acidified epoxy oligomer, a free radical photoinitiator and a monomer capable of being polymerized by the photoinitiator are used to form aqueous developable, photodefined coatings useful as permanent solder marks for printed circuits and permanent plating resists for additive printed wiring boards.
The process for using the compositions include application as a fluid in solvents; drying; exposing to ultraviolet light; developing in an aqueous alkaline solution; and crosslinking the acidified, epoxy oligomers. The articles produced include printed wiring boards with the permanent, photoimaged resist composition thereon.
REFERENCES:
patent: 4074008 (1978-02-01), Green
patent: 4119609 (1978-10-01), Allen et al.
patent: 4171974 (1979-10-01), Golda et al.
patent: 4438189 (1984-03-01), Geissler et al.
patent: 4548895 (1985-10-01), Irving et al.
patent: 4621043 (1986-11-01), Gervay
patent: 4624912 (1986-11-01), Zweifel et al.
patent: 4657779 (1987-04-01), Gaske
patent: 4714751 (1987-12-01), Schornick et al.
patent: 4786579 (1988-11-01), Tazawa et al.
patent: 4789620 (1988-12-01), Sasaki et al.
Chemical Abstracts 85: 162069m.
Patent Abstracts of Japan, vol. 12, No. 40 (C-474) [2887].
Japanese Laid Open Application 187,722 of 1987 (Derwent World Patent Index), abstract.
Japanese Laid Open Application 75, 786 of 1976 (Derwent World Patent Index), abstract.
Chemical Abstracts 108(26):229636h (Abstract of JP 62187722 of 1987).
Johnson Steven M.
Leech Edward J.
AMP-Akzo Corporation
Haven Corporation
McCamish Marion E.
RoDee C. D.
LandOfFree
Photoimageable permanent resist does not yet have a rating. At this time, there are no reviews or comments for this patent.
If you have personal experience with Photoimageable permanent resist, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Photoimageable permanent resist will most certainly appreciate the feedback.
Profile ID: LFUS-PAI-O-1696536