Photoelectron emission microscope for wafer and reticle...

Details Photoelectron emission microscope for wafer and reticle... Photoelectron emission microscope for wafer and reticle...

2005-12-27

2005-12-27

Lee, John R. (Department: 2881)

Radiant energy

Inspection of solids or liquids by charged particles

Methods

C250S306000

Reexamination Certificate

active

06979819

ABSTRACT:
A method of inspecting and imaging substrates with an electron beam. The method can include a illuminating the substrate with a photon beam to cause photoemission of electrons. A low energy electron beam can be used to prevent or reduce positive charging of the substrate. Reflected electrons and/or emitted photoelectrons can be imaged to review or inspect the substrate.

REFERENCES:
patent: 4453086 (1984-06-01), Grobman
patent: 5118941 (1992-06-01), Larson
patent: 5256877 (1993-10-01), Czernuszka et al.
patent: 5286974 (1994-02-01), Walker et al.
patent: 5432345 (1995-07-01), Kelly
patent: 5444242 (1995-08-01), Larson et al.
patent: 5796101 (1998-08-01), Haight et al.
patent: 5973323 (1999-10-01), Adler et al.
patent: 6252412 (2001-06-01), Talbot et al.
patent: 6310341 (2001-10-01), Todokoro et al.
patent: 6317514 (2001-11-01), Reinhorn et al.
patent: 6465781 (2002-10-01), Nishimura et al.
patent: 6717145 (2004-04-01), Takagi et al.
patent: 2001/0010357 (2001-08-01), Ose et al.
E. Bauer, et al. Surface Studies by Low-Energy Electron Microscopy (LEEM) and Conventional UV Photoemission Electron Microscopy (PEEM); Jan. 1989, pp. 49-57; Fed. Rep. Of Germany.

Affiliated with

Also associated with

Rating

Photoelectron emission microscope for wafer and reticle... does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Photoelectron emission microscope for wafer and reticle..., we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Photoelectron emission microscope for wafer and reticle... will most certainly appreciate the feedback.

Rate now

Comments { 0 }

Profile ID: LFUS-PAI-O-3469026