Radiation imagery chemistry: process – composition – or product th – Imaging affecting physical property of radiation sensitive... – Radiation sensitive composition or product or process of making
Reexamination Certificate
2006-10-06
2010-11-16
Lee, Sin J. (Department: 1795)
Radiation imagery chemistry: process, composition, or product th
Imaging affecting physical property of radiation sensitive...
Radiation sensitive composition or product or process of making
C430S921000, C430S925000, C430S919000, C568S028000, C568S030000, C568S031000, C568S032000, C568S033000, C568S034000, C568S035000, C568S074000, C568S075000, C568S077000, C522S031000, C526S243000, C526S245000, C526S247000, C526S248000, C526S287000, C526S288000
Reexamination Certificate
active
07833690
ABSTRACT:
The present invention relates to photoacid generating compounds, lithographic resists comprising photoacid generating compounds, and to various lithographic processes techniques, and applications. In one embodiment, the present invention provides a photoacid generator of Formula (I):
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English abstract for JP 10-221852 provided by JPO.
Machine-assisted English translation for JP 10-221852 provided by JPO.
Wang et al (“Novel Anionic Photoacid Generators (PAGs) and Corresponding PAG Bound Polymers”, Macromolecular Rapid Communications, 2006, vol. 27, issue 18 (date Sep. 22, 2006).
Machine-assisted English translation of JP2006-178317 provided by JPO.
English abstract of JP2003-322972 provided by JPO.
English abstract of JP11-167199 provided by JPO.
Gonsalves Kenneth E.
Wang Mingxing
Kilpatrick & Stockton LLP
Lee Sin J.
The University of North Carolina at Charlotte
Wimbish J. Clinton
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