Photo mask and method of manufacturing the same, and method...

Details Photo mask and method of manufacturing the same, and method... Photo mask and method of manufacturing the same, and method...

2006-03-10

2008-10-07

Rosasco, Stephen (Department: 1795)

Radiation imagery chemistry: process, composition, or product th

Imaging affecting physical property of radiation sensitive...

Forming nonplanar surface

Reexamination Certificate

active

07432043

ABSTRACT:
The present invention relates to a photo mask and a method of manufacturing the same, and a method of forming a photosensitive film pattern using the photo mask. A photo mask pattern having an exposure region, a phase-inverse region and a photosensitive region is provided. The predetermined size and shape of the patterns on the photo mask are formed. Through this manner, distortions of the photosensitive film pattern upon development are compensated and a target photosensitive film pattern can be more accurately acquired. Furthermore, the depth of focus of a photolithography process can be increased.

REFERENCES:
patent: 1020020002015 (2002-01-01), None
patent: 1020020002947 (2002-01-01), None

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