Phase changeable memory devices including nitrogen and/or...

Active solid-state devices (e.g. – transistors – solid-state diode – Field effect device – Having insulated electrode

Reexamination Certificate

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C257S209000, C257S211000, C257S246000, C257S247000, C257S248000, C257S249000, C257S529000, C257S758000, C257S759000, C257S760000, C257S904000

Reexamination Certificate

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07462900

ABSTRACT:
Phase-changeable memory devices and method of fabricating phase-changeable memory devices are provided that include a phase-changeable material pattern of a phase-changeable material that may include nitrogen atoms and/or silicon atoms. First and second electrodes are electrically connected to the phase-changeable material pattern and provide an electrical signal thereto. The phase-changeable material pattern may have a polycrystal line structure.

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