Active solid-state devices (e.g. – transistors – solid-state diode – Field effect device – Having insulated electrode
Reexamination Certificate
2005-11-23
2009-06-02
Warren, Matthew E (Department: 2815)
Active solid-state devices (e.g., transistors, solid-state diode
Field effect device
Having insulated electrode
C257S298000, C257S306000, C257S311000, C257SE27084, C257SE29343
Reexamination Certificate
active
07541633
ABSTRACT:
A PRAM and a fabricating method thereof are provided. The PRAM includes a transistor and a data storage capability. The data storage capability is connected to the transistor. The data storage includes a top electrode, a bottom electrode, and a porous PCM layer. The porous PCM layer is interposed between the top electrode and the bottom electrode.
REFERENCES:
patent: 7214958 (2007-05-01), Happ
patent: 7323708 (2008-01-01), Lee et al.
patent: 2005/0019975 (2005-01-01), Lee et al.
patent: 1536688 (2004-10-01), None
Office Action from corresponding Chinese Application No. 200510126836.7, mailed on Aug. 22, 2008.
Khang Yoon-ho
Lee Sang-mock
Noh Jin-seo
Suh Dong-seok
Yim Jin-heong
Buchanan & Ingersoll & Rooney PC
Samsung Electronics Co,. Ltd.
Warren Matthew E
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