Patterning of semiconductive polymers

Details Patterning of semiconductive polymers Patterning of semiconductive polymers

1991-08-22

1994-07-12

Bowers, Jr., Charles L.

Radiation imagery chemistry: process, composition, or product th

Imaging affecting physical property of radiation sensitive...

Making named article

430313, 430330, 427272, 4273922, 427384, B05D 132, G03C 500

Patent

active

053288092

ABSTRACT:
A method is provided for forming in a semiconductive conjugated polymer at least first and second regions having different optical properties. The method comprises: forming a layer of a precursor polymer and permitting the first region to come into contact with a reactant, such as an acid, and heat while permitting the second region to come into contact with a lower concentration of the reactant. The reactant affects the conversion conditions of the precursor polymer in such a way as to control the optical properties of at least the first region so that the optical properties of the first region are different from those of the second region.
The precursor polymer may comprise a poly(arylene-1,2-ethanediyl) polymer, at least some of the ethane groups of which include a modifier group whose susceptibility to elimination is increased in the presence of the reactant.

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