Radiation imagery chemistry: process – composition – or product th – Imaging affecting physical property of radiation sensitive... – Forming nonplanar surface
Patent
1983-12-14
1986-02-04
Kittle, John E.
Radiation imagery chemistry: process, composition, or product th
Imaging affecting physical property of radiation sensitive...
Forming nonplanar surface
430297, 430346, 430945, 427 531, 427 541, 156643, 2504921, 2504922, G03C 500, B05D 306, B44C 122
Patent
active
045686327
ABSTRACT:
A method is described for photoetching polyimides efficiently, and without the need for any chemical development steps. At least 1000.ANG. of the polyimide are removed by irradiation of the polyimide with ultraviolet radiation having wavelengths less than 220 nm. To enhance the process, the power density of the radiation is greater than about 60 mJ/cm.sup.2. The presence of an atmosphere containing oxygen enhances the etch rate, although photoetching will occur in other atmospheres.
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patent: 4414059 (1983-11-01), Blum et al.
patent: 4417948 (1983-11-01), Mayne-Banton et al.
Surinder Bahl, "Stripping Kapton Polyimide Film in Kapton Flexible Cables Using a CO.sub.2 Laser", Research Disclosure, Sep. 1978, No. 17318, p. 23.
K. Jain et al, "Ultrafast Deep UV Lithography with Excimer Lasers", IEEE Electron Device Letters, vol. 3, EDL-3, No. 3, Mar. 1982, pp. 53-55.
S.N. 396,985, "Self Developing, Photoetching of Polyesters by Far UV Radiation", V. Mayne-Banton et al.
H. Meinhold, "Material Machining by Laser, Electron, Ind. (Germany), vol. 2, No. 3, Mar. 20, 1971.
Blum Samuel E.
Holloway Karen L.
Srinivasan Rangaswamy
Hamilton Cynthia
International Business Machines - Corporation
Kittle John E.
Stanland Jackson E.
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