Radiation imagery chemistry: process – composition – or product th – Imaging affecting physical property of radiation sensitive... – Electron beam imaging
Patent
1998-09-18
2000-09-12
Young, Christopher G.
Radiation imagery chemistry: process, composition, or product th
Imaging affecting physical property of radiation sensitive...
Electron beam imaging
430942, G03C 500
Patent
active
061176176
ABSTRACT:
A high-resolution patterning method of a resist layer is disclosed by patternwise irradiation of the resist layer with electron beams utilizing a methanofullerene compound as the electron beam resist material, which is graphitized and made insoluble in an organic solvent by the electron beam irradiation in a dose of, for example, 1.times.10.sup.-4 C/cm.sup.2 or larger. The thus formed resist layer is highly resistant against dry etching to ensure utilizability of the method in the fine patterning work for the manufacture of semiconductor devices.
REFERENCES:
patent: 5561026 (1996-10-01), Aoki
Kanayama Toshihiko
Palmer Richard Edward
Robinson Alexander Phillip
Tada Tetsuya
Japan as represented by Director of Agency of Industrial Science
The University of Birmingham
Young Christopher G.
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