Patterning method using a photomask

Details Patterning method using a photomask Patterning method using a photomask

2006-02-21

2006-02-21

Rosasco, S. (Department: 1756)

Radiation imagery chemistry: process, composition, or product th

Imaging affecting physical property of radiation sensitive...

Making electrical device

Reexamination Certificate

active

07001711

ABSTRACT:
An isolated light-shielding pattern formed from a light-shielding film region101and a phase shift region102is formed on a transparent substrate100serving as a mask. The phase shift region102has a phase difference with respect to a light-transmitting region of the transparent substrate100. Moreover, the width of the phase shift region102is set such that a light-shielding property of the phase shift region102becomes at least about the same as that of a light-shielding film having the same width.

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