4. Radiant energy
  5. Irradiation of objects or material
  6. Irradiation of semiconductor devices

Akio Misaka

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Dry-etching process simulator

Etching a substrate: processes – Gas phase etching of substrate – With measuring – testing – or inspecting
Patent

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Electron beam exposure evaluation method

Radiant energy – Irradiation of objects or material – Irradiation of semiconductor devices
Patent

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Mask data creation method

Radiation imagery chemistry: process – composition – or product th – Radiation modifying product or process of making – Radiation mask
Reexamination Certificate

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Mask data creation method

Radiation imagery chemistry: process – composition – or product th – Radiation modifying product or process of making – Radiation mask
Reexamination Certificate

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Method and apparatus for writing a pattern on a semiconductor sa

Boots – shoes – and leggings
Patent

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Profile ID: LFUS-PAI-P-727963

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