Patterning material and patterning method

Details Patterning material and patterning method Patterning material and patterning method

1996-11-04

1999-07-27

Chu, John S.

Radiation imagery chemistry: process, composition, or product th

Imaging affecting physical property of radiation sensitive...

Forming nonplanar surface

430313, 430325, 430330, G03F 736, G03F 740

Patent

active

059288400

ABSTRACT:
A patterning material includes a polymer represented by a general formula: ##STR1## wherein R.sub.1 indicates a hydrogen atom or an alkyl group; R.sub.2 indicates a hydrophobic protecting group which is easily desorbed through a function of an acid; R.sub.3 indicates a hydrogen atom or an alkyl group; R.sub.4 and R.sub.5 independently indicate a hydrogen atom, an alkyl group, a phenyl group or an alkenyl group, or together indicate a cyclic alkyl group, a cyclic alkenyl group or a cyclic alkyl or alkenyl group having a phenyl group; x satisfies a relationship of 0<x<1; and y satisfies a relationship of 0<y<1.

REFERENCES:
patent: 4869995 (1989-09-01), Shirai et al.
patent: 5066566 (1991-11-01), Novembre
patent: 5278029 (1994-01-01), Shirai et al.
patent: 5658711 (1997-08-01), Matsuo et al.
patent: 5741628 (1998-04-01), Matsuo et al.

Affiliated with

Also associated with

Rating

Patterning material and patterning method does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Patterning material and patterning method, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Patterning material and patterning method will most certainly appreciate the feedback.

Rate now

Comments { 0 }

Profile ID: LFUS-PAI-O-877167