Patterning compositions using E-beam lithography and...

Details Patterning compositions using E-beam lithography and... Patterning compositions using E-beam lithography and...

2005-07-19

2005-07-19

Young, Christopher G. (Department: 1756)

Radiation imagery chemistry: process, composition, or product th

Imaging affecting physical property of radiation sensitive...

Electron beam imaging

C430S320000, C430S321000, C430S942000

Reexamination Certificate

active

06919164

ABSTRACT:
A method of patterning a layer of e-beam sensitive dielectric material, such as bisbenzocyclobutene monomers, using electron beam lithography.

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