Radiation imagery chemistry: process – composition – or product th – Imaging affecting physical property of radiation sensitive... – Forming nonplanar surface
Patent
1989-12-29
1991-12-10
McCamish, Marion E.
Radiation imagery chemistry: process, composition, or product th
Imaging affecting physical property of radiation sensitive...
Forming nonplanar surface
430330, 430270, G03F 7039
Patent
active
050717332
ABSTRACT:
A patterned thin film suitable for use in electric and electronic devices, prepared from a polymer or a mixture of the polymer and other known compounds capable of forming a thin film by LB technique, said polymer having linear recurring units wherein an organic group R.sup.1 having at least 2 carbon atoms and a valence of at least 2 is combined alternately with an organic group R.sup.2 having at least 2 carbon atoms and a valence of at least 2 through a bivalent group formed by a reaction of an acid group A containing a hetero atom and a basic group B containing a hetero atom, and wherein a hydrocarbon-containing group R.sup.3 having 10 to 30 carbon atoms which may contain a substituent group, is linked by covalent or ionic bond to said recurring units, the number of groups R.sup.3 being at least 2 per 10 recurring units. The patterned thin film is prepared by building up a layer or layers of the polymer or a mixture of the polymer and a compound capable of forming a film by LB technique onto a substrate according to the LB technique, irradiating patternwise the built-up film with high energy rays, and developing the irradiated film, or by forming the built-up film in the same manner as above on a patterned, removal film formed on a substrate, and removing the patterned film from the substrate, and if desired, by further subjecting the obtained pattern to a reaction to convert the polymer, when it has a structure as a precursor, into a polymer having a 5-membered or 6-membered heterocyclic structure.
REFERENCES:
patent: 3312663 (1967-04-01), Sorenson
patent: 3326851 (1987-06-01), Tocker
patent: 3551383 (1970-12-01), Fang
patent: 3694208 (1972-09-01), Ranz et al.
patent: 4022732 (1977-05-01), Schwarcz
patent: 4092442 (1978-05-01), Agnihotri et al.
patent: 4578328 (1986-03-01), Kray
patent: 4579809 (1986-04-01), Irving
patent: 4606998 (1986-08-01), Clodgo et al.
patent: 4740396 (1988-04-01), Uekita et al.
patent: 4751171 (1988-06-01), Ogawa
patent: 4801420 (1989-01-01), Uekita
patent: 4822853 (1989-04-01), Uekita et al.
patent: 4824766 (1989-04-01), Ogawa
patent: 4839219 (1989-06-01), Uekita et al.
patent: 4886734 (1989-12-01), Moore et al.
Engel et al, "Polymeric Materials Science and Engineering"--Proceedings of the ACS Division of Polymeric Materials, 1986.
Vincett et al, Thin Solid Films, 68, 1980, pp. 135-171.
Cemel et al, J. Polym. Sci., Part A-1, vol. 10, 2061-2083 (1972).
Enkelmann et al, J. Poly. Sci.: Poly. Chem Ed., vol. 15, 1843-1854 (1977).
Barraud et al, J. Colloid Interface Sci., vol. 62, 509-523 (1977).
Lieser et al, Thin Solid Films, vol. 68, 77-90 (1980).
Tredgold et al, Thin Solid Films, vol. 99, 81-85 (1983).
Tredgold et al, J. Phys. D: Appl. Phys., vol. 18, 2483-2487 (1985).
"Method for preparation of polyimide monomolecular film and built-up film", a brochure handed out at Fine Chemical Exposition, Mar. 11-13, 1986.
"Polyimide Built-up Film", a preprint for the Annual Spring Meeting of Japan Chemical Society, Apr. 1, 1986.
Engel et al, J. Am. Chem. Soc., 1985, 107, pp. 8308-8310.
Suzuki et al, Chemistry Letters, 1986, pp. 395-398.
Kakimoto et al, Chemistry Letters, 1986, pp. 823-826.
Awaji Hiroshi
Mizunuma Satoshi
Murata Makoto
Uekita Masakazu
Kanegafuchi Kagaku Kogyo & Kabushiki Kaisha
McCamish Marion E.
Rodee Christopher D.
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