Pattern writing apparatus using charged particle beam, and...

Details Pattern writing apparatus using charged particle beam, and... Pattern writing apparatus using charged particle beam, and...

2007-08-17

2009-10-20

Wells, Nikita (Department: 2881)

Radiant energy

Irradiation of objects or material

Irradiation of semiconductor devices

C250S492200, C250S492100, C250S492300, C250S398000, C430S296000, C430S942000, C430S030000

Reexamination Certificate

active

07605383

ABSTRACT:
A charged particle beam pattern writing apparatus includes an input part for inputting a predetermined command, a check part for checking a state of a predetermined function used for pattern writing using a charged particle beam, based on the predetermined command, and an output part for outputting the state of the predetermined function which has been checked.

REFERENCES:
patent: 2008/0011965 (2008-01-01), Matsukawa et al.
patent: 2008/0067423 (2008-03-01), Kimura et al.
patent: 2008/0078947 (2008-04-01), Horiuchi et al.
patent: 2008/0235535 (2008-09-01), Sakai et al.
patent: 10-242027 (1998-09-01), None
U.S. Appl. Np. 12/406,390, filed Mar. 18, 2009, Goshima.

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