Radiation imagery chemistry: process – composition – or product th – Imaging affecting physical property of radiation sensitive... – Making named article
Patent
1996-09-20
1997-11-25
McPherson, John A.
Radiation imagery chemistry: process, composition, or product th
Imaging affecting physical property of radiation sensitive...
Making named article
216 26, G03F 700
Patent
active
056911165
ABSTRACT:
A method for forming lenslets which collect light and focus the light onto photosensitive elements of an electronic imager. The method includes providing a transparent lenslet-forming layer on a substrate or on layers on the substrate, forming a thin etch-stop layer on the transparent lenslet-forming layer and patterning a thin photosensitive resin mask on the etch-stop layer so that the mask pattern corresponds to lenslets to be formed. The method further includes transferring by etching the pattern of the photosensitive resin mask to the thin etch-stop layer to form a thin etch-stop mask, anisotropically plasma etching the transparent lenslet-forming layer according to the patterned thin etch-stop mask, removing the thin etch-stop mask, and thermally reflowing the etched transparent lenslet-forming layer to form the lenslets.
REFERENCES:
patent: 4689291 (1987-08-01), Popovic et al.
Y. Ishihara et al., "A High Photosensitivity IL-CCD Image Sensor with Monolithic Resin Lens Array," International Electron Devices Meeting, 1983, pp. 497-500.
J. M. Moran and D. J. Maydan (Journal of Vacuum Science Technology, 1979, 16, pp. 1620-1624).
"Electronic and Photonic Properties of Polymers," M. J. Bowden and S. R. Turner, eds., American Chemical Society: Washington, DC, 1978, pp. 158-166 .
Barry Stephen P.
Hirsh Jeffrey I.
Jech Joseph
Nutt Alan C. G.
Revelli Joseph F.
Eastman Kodak Company
McPherson John A.
Owens Raymond L.
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