Optics: measuring and testing – By configuration comparison – With comparison to master – desired shape – or reference voltage
Reexamination Certificate
2005-01-11
2005-01-11
Font, Frank G. (Department: 2877)
Optics: measuring and testing
By configuration comparison
With comparison to master, desired shape, or reference voltage
C356S237100, C356S237500
Reexamination Certificate
active
06842245
ABSTRACT:
A pattern test device has a reference data generator for generating reference pattern data and setting a first sub-area or a second sub-area in a mask area depending on the accuracy for the pattern test. A threshold selecting section selects first or second threshold depending on the test location residing in the first sub-area or second sub-area, whereby the judgement section judges presence or absence of a defect in the mask area while using the first or second threshold to compare therewith difference data between the test pattern data and the reference pattern data.
REFERENCES:
patent: 3944369 (1976-03-01), Cuthbert et al.
patent: 4365163 (1982-12-01), Davis et al.
patent: 4559603 (1985-12-01), Yoshikawa
patent: 4692690 (1987-09-01), Hara et al.
patent: 4718767 (1988-01-01), Hazama
patent: 4791586 (1988-12-01), Maeda et al.
patent: 5173719 (1992-12-01), Taniguchi et al.
patent: 5235400 (1993-08-01), Terasawa et al.
patent: 10-38812 (1998-02-01), None
Font Frank G.
NEC Electronics Corporation
Nguyen Sang H.
Young & Thompson
LandOfFree
Pattern test device does not yet have a rating. At this time, there are no reviews or comments for this patent.
If you have personal experience with Pattern test device, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Pattern test device will most certainly appreciate the feedback.
Profile ID: LFUS-PAI-O-3380826