Radiation imagery chemistry: process – composition – or product th – Imaging affecting physical property of radiation sensitive... – Forming nonplanar surface
Patent
1996-09-12
1998-11-03
Baxter, Janet C.
Radiation imagery chemistry: process, composition, or product th
Imaging affecting physical property of radiation sensitive...
Forming nonplanar surface
4302731, 430909, 430950, G03C 500
Patent
active
058306234
ABSTRACT:
It is an object of the present invention to obtain a resist pattern of a high dimensional accuracy. In order to accomplish this object, a pattern lithography method according to the present invention comprises the steps of: forming a resist film 2 on a substrate 1 to be processed; applying a hydrous polymer solution 4 on the resist film 2; cross-linking polymers in the hydrous polymer solution to form a hydrogel film 4a of a predetermined thickness; and pattern-exposing the resist film 2 through the hydrogel film, and then, removing the hydrogel film 4a.
REFERENCES:
patent: 5529888 (1996-06-01), Watanabe et al.
patent: 5541037 (1996-07-01), Hatakeyama et al.
patent: 5652297 (1997-07-01), McCulloch et al.
T. Tanaka et al., "A New Photolithography Technique with Antireflective Coating on Resist: ARCOR".
J. Electrochem. Soc, vol. 137, No. 12, Dec. 1990, pp. 3900-3904.
T. A. Brunner et al., "A Top Antireflector Process for Improved Linewidth Control and Alignment", J. Vac. Sci. Technol., vol. 9, No. 6, Nov./Dec. 1991, pp. 3418-3422.
Ikeda Takahiro
Maruyama Yumiko
Ashton Rosemary
Baxter Janet C.
Kabushiki Kaisha Toshiba
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