Pattern inspection method and system

Details Pattern inspection method and system Pattern inspection method and system

1997-03-11

2000-05-16

Font, Frank G.

Optics: measuring and testing

By configuration comparison

With two images of single article compared

356384, 356237, G01B 1100

Patent

active

060644842

ABSTRACT:
A pattern inspection method includes the steps of: obtaining first image data by optically picking up an actually formed pattern such as a reticle; aligning a position of the first image data with second image data of a pattern at a different layer from that of the first image data; and performing a first pattern inspection using the first and second image data. Defect inspection can be executed in a short time with a practically sufficient precision.

REFERENCES:
patent: 4448532 (1984-05-01), Joseph et al.
patent: 4926489 (1990-05-01), Danielson et al.
patent: 5369430 (1994-11-01), Kitamura

Affiliated with

Also associated with

Rating

Pattern inspection method and system does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Pattern inspection method and system, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Pattern inspection method and system will most certainly appreciate the feedback.

Rate now

Comments { 0 }

Profile ID: LFUS-PAI-O-263563