Optics: measuring and testing – Inspection of flaws or impurities – Surface condition
Reexamination Certificate
2011-01-18
2011-01-18
Toatley, Gregory J (Department: 2877)
Optics: measuring and testing
Inspection of flaws or impurities
Surface condition
C356S237400
Reexamination Certificate
active
07872745
ABSTRACT:
A pattern inspection apparatus includes a light source configured to emit a pulsed light, a stage on which an inspection target workpiece is placed, a sensor, including a plurality of light receiving elements two-dimensionally arrayed, configured to capture a pattern image in a two-dimensional region of the inspection target workpiece which is irradiated with the pulsed light, by using the plurality of light receiving elements, and a comparing unit configured to compare data of the pattern image with predetermined reference pattern image data, wherein the stage moves to be shifted by a number of pixels, being the number of natural number times one pixel, between pulses of the pulsed light.
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patent: 2004/0146295 (2004-07-01), Furman et al.
patent: 2002-107912 (2002-04-01), None
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Abe Takayuki
Arai Tetsuyuki
Iijima Tomohiro
Tsuchiya Hideo
NuFlare Technology, Inc.
Oblon, Spivak McClelland, Maier & Neustadt, L.L.P.
Toatley Gregory J
Ton Tri T
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