Pattern inspection apparatus and pattern inspection method

Details Pattern inspection apparatus and pattern inspection method Pattern inspection apparatus and pattern inspection method

2011-01-18

2011-01-18

Toatley, Gregory J (Department: 2877)

Optics: measuring and testing

Inspection of flaws or impurities

Surface condition

C356S237400

Reexamination Certificate

active

07872745

ABSTRACT:
A pattern inspection apparatus includes a light source configured to emit a pulsed light, a stage on which an inspection target workpiece is placed, a sensor, including a plurality of light receiving elements two-dimensionally arrayed, configured to capture a pattern image in a two-dimensional region of the inspection target workpiece which is irradiated with the pulsed light, by using the plurality of light receiving elements, and a comparing unit configured to compare data of the pattern image with predetermined reference pattern image data, wherein the stage moves to be shifted by a number of pixels, being the number of natural number times one pixel, between pulses of the pulsed light.

REFERENCES:
patent: 6909501 (2005-06-01), Ogawa et al.
patent: 7525659 (2009-04-01), Furman et al.
patent: 2004/0146295 (2004-07-01), Furman et al.
patent: 2002-107912 (2002-04-01), None
patent: 2007-102153 (2007-04-01), None

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