Pattern forming process

Details Pattern forming process Pattern forming process

1991-03-21

1994-01-04

Rodee, Christopher

Radiation imagery chemistry: process, composition, or product th

Imaging affecting physical property of radiation sensitive...

Forming nonplanar surface

430325, 430330, 430192, 430190, 430270, G03F 730

Patent

active

052759210

ABSTRACT:
In a pattern forming process using a chemical amplification type resist, a good pattern with high contrast between exposed portions and non-exposed portions due to photobleach of a dye and a large process latitude can be obtained by adding a dye such as Sudan Orange, or a dye having a reducing absorption by exposure to light such as naphthoquinonediazide sulfonic acid ester to a chemical amplification type resist for ultraviolet rays, particularly i-line of 365 nm or ultraviolet rays of 365 nm or less.

REFERENCES:
patent: 3925077 (1975-12-01), Lewis et al.
patent: 4491628 (1985-01-01), Ito et al.
patent: 4818658 (1989-04-01), Martin et al.
patent: 4996136 (1991-02-01), Houlihan et al.
patent: 5064741 (1991-11-01), Koike et al.
A. R. Neureuther, "Photoresist Containing Absorbing Dye," IBM Technical Disclosure Bulletin, vol. 16, No. 1, pp. 334-336, Jun. 1973.

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