Radiation imagery chemistry: process – composition – or product th – Imaging affecting physical property of radiation sensitive... – Forming nonplanar surface
Patent
1995-06-05
1997-04-29
Rosasco, S.
Radiation imagery chemistry: process, composition, or product th
Imaging affecting physical property of radiation sensitive...
Forming nonplanar surface
430311, 430322, G03C 500
Patent
active
056247915
ABSTRACT:
A mask includes a transparent layer which is transparent with respect to a light which is used for an exposure, and a mask pattern layer which is formed on the transparent layer. At least a portion of the mask patterns layer is made up solely of a phase shift layer for transmitting the light, so that a phase shift occurs between a phase of the light transmitted through the phase shift layer and a phase of the light transmitted through a portion of the mask having no phase shift layer.
REFERENCES:
patent: 4890309 (1989-12-01), Smith
patent: 5045147 (1991-09-01), Okamoto
patent: 5132186 (1992-07-01), Takeuchi et al.
Levenson et al., "Improving Resolution in Photolithography with a Phase-Shifting Mask", IEEE Transactions on Electron Devices, vol. ED-29, No. 12, Dec. 1982 is described in the introductory part of the present specification.
Toh, Dao, Singh and Daw, "Chromeless Phase-Shifted Masks: A New Approach to Phase-Shifting Masks", Tenth Annual Symposium on Microlithography of Bacus, Sep., 1990.
Kawabata Toshiaki
Nakagawa Kenji
Sumi Kazuhiko
Taguchi Masao
Yamaguchi Seiichiro
Fujitsu Ltd.
Rosasco S.
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