Radiation imagery chemistry: process – composition – or product th – Imaging affecting physical property of radiation sensitive... – Forming nonplanar surface
Reexamination Certificate
2008-06-24
2011-10-11
Chu, John S (Department: 1795)
Radiation imagery chemistry: process, composition, or product th
Imaging affecting physical property of radiation sensitive...
Forming nonplanar surface
C430S270100, C430S330000, C430S331000, C430S905000, C430S910000
Reexamination Certificate
active
08034547
ABSTRACT:
A pattern forming method includes (a) coating a substrate with a resist composition including a resin that includes a repeating unit represented by a following general formula (NGH-1), and, by the action of an acid, increases the polarity and decreases the solubility in a negative developing solution; (b) exposing; and (d) developing with a negative developing solution:wherein RNGH1represents a hydrogen atom or an alkyl group; and RNGH2to RNGH4each independently represents a hydrogen atom or a hydroxyl group, provided that at least one of RNGH2to RNGH4represents a hydroxyl group.
REFERENCES:
patent: 4099062 (1978-07-01), Kitcher
patent: 4212935 (1980-07-01), Canavello et al.
patent: 4267258 (1981-05-01), Yoneda et al.
patent: 4318976 (1982-03-01), Shu et al.
patent: 4491628 (1985-01-01), Ito et al.
patent: 4690887 (1987-09-01), Fukuda et al.
patent: 4777119 (1988-10-01), Brault et al.
patent: 5250375 (1993-10-01), Sebald et al.
patent: 5268260 (1993-12-01), Bantu et al.
patent: 5326840 (1994-07-01), Przybilla et al.
patent: 5470693 (1995-11-01), Sachdev et al.
patent: 5738975 (1998-04-01), Nakano et al.
patent: 5858620 (1999-01-01), Ishibashi et al.
patent: 5866304 (1999-02-01), Nakano et al.
patent: 6030541 (2000-02-01), Adkisson et al.
patent: 6147394 (2000-11-01), Bruce et al.
patent: 6221568 (2001-04-01), Angelopoulos et al.
patent: 6338934 (2002-01-01), Chen et al.
patent: 6406829 (2002-06-01), Tachikawa et al.
patent: 6509134 (2003-01-01), Ito et al.
patent: 6555607 (2003-04-01), Kanada et al.
patent: 6579657 (2003-06-01), Ishibashi et al.
patent: 6593058 (2003-07-01), Feiring et al.
patent: 6800423 (2004-10-01), Yokoyama et al.
patent: 6998358 (2006-02-01), French et al.
patent: 7016754 (2006-03-01), Poolla et al.
patent: 7129199 (2006-10-01), Zhang et al.
patent: 7348127 (2008-03-01), Hinsber, III
patent: 7354693 (2008-04-01), Hatakeyama et al.
patent: 7371510 (2008-05-01), Hirayama et al.
patent: 7396482 (2008-07-01), Brandl
patent: 7399577 (2008-07-01), Yamato et al.
patent: 7445883 (2008-11-01), Baba-Ali et al.
patent: 7455952 (2008-11-01), Hatakeyama et al.
patent: 7608386 (2009-10-01), Nozaki et al.
patent: 7670750 (2010-03-01), Harada et al.
patent: 7678537 (2010-03-01), Allen et al.
patent: 7700260 (2010-04-01), Kanna et al.
patent: 7771914 (2010-08-01), Hatakeyama et al.
patent: 7851140 (2010-12-01), Tsubaki
patent: 2002/0045122 (2002-04-01), Iwasa et al.
patent: 2002/0132184 (2002-09-01), Babcock
patent: 2003/0022095 (2003-01-01), Kai et al.
patent: 2003/0073027 (2003-04-01), Namiki et al.
patent: 2003/0091936 (2003-05-01), Rottstegge et al.
patent: 2003/0143483 (2003-07-01), Takechi
patent: 2004/0023150 (2004-02-01), Feiring et al.
patent: 2004/0023152 (2004-02-01), Feiring et al.
patent: 2004/0096780 (2004-05-01), Nozaki et al.
patent: 2004/0229157 (2004-11-01), Rhodes et al.
patent: 2005/0095532 (2005-05-01), Kodama et al.
patent: 2005/0203262 (2005-09-01), Feiring et al.
patent: 2005/0224923 (2005-10-01), Daley et al.
patent: 2006/0008736 (2006-01-01), Kanda et al.
patent: 2006/0040203 (2006-02-01), Kodama et al.
patent: 2006/0073420 (2006-04-01), Nozaki et al.
patent: 2006/0105267 (2006-05-01), Khojasteh et al.
patent: 2006/0204890 (2006-09-01), Kodama
patent: 2006/0210919 (2006-09-01), Mizutani et al.
patent: 2006/0257781 (2006-11-01), Benoit et al.
patent: 2007/0003878 (2007-01-01), Paxton et al.
patent: 2007/0054217 (2007-03-01), Kodama et al.
patent: 2007/0087288 (2007-04-01), Nishiyama et al.
patent: 2007/0105045 (2007-05-01), Iwato et al.
patent: 2007/0254237 (2007-11-01), Allen et al.
patent: 2008/0063984 (2008-03-01), Zhang et al.
patent: 2008/0113300 (2008-05-01), Choi et al.
patent: 2008/0131820 (2008-06-01), Van Steenwinckel et al.
patent: 2008/0187860 (2008-08-01), Tsubaki et al.
patent: 2008/0261150 (2008-10-01), Tsubaki et al.
patent: 2008/0311530 (2008-12-01), Allen et al.
patent: 2008/0318171 (2008-12-01), Tsubaki
patent: 2009/0011366 (2009-01-01), Tsubaki et al.
patent: 2009/0042147 (2009-02-01), Tsubaki
patent: 2010/0040971 (2010-02-01), Tarutani et al.
patent: 2010/0040972 (2010-02-01), Tarutani et al.
patent: 2010/0167201 (2010-07-01), Tsubaki
patent: 2010/0190106 (2010-07-01), Tsubaki
patent: 2010/0239984 (2010-09-01), Tsubaki
patent: 2010/0323305 (2010-12-01), Tsubaki et al.
patent: 2010/0330507 (2010-12-01), Tsubaki et al.
patent: 2011/0020755 (2011-01-01), Tsubaki
patent: 0102450 (1984-03-01), None
patent: 0519297 (1992-12-01), None
patent: 1 338 921 (2003-08-01), None
patent: 1 500 977 (2005-01-01), None
patent: 1612604 (2006-01-01), None
patent: 1 720 072 (2006-11-01), None
patent: 1764652 (2007-03-01), None
patent: 1 980 911 (2008-10-01), None
patent: 57-153433 (1982-09-01), None
patent: 59-045439 (1984-03-01), None
patent: 4-039665 (1992-02-01), None
patent: 05-241348 (1993-09-01), None
patent: 5-265212 (1993-10-01), None
patent: 6-138666 (1994-05-01), None
patent: 6-194847 (1994-07-01), None
patent: 7-181677 (1995-07-01), None
patent: 7-199467 (1995-08-01), None
patent: 7-220990 (1995-08-01), None
patent: 7-261392 (1995-10-01), None
patent: 9-244247 (1997-09-01), None
patent: 10-073927 (1998-03-01), None
patent: 11-145036 (1999-05-01), None
patent: 2000-199953 (2000-07-01), None
patent: 2000-321789 (2000-11-01), None
patent: 2001-019860 (2001-01-01), None
patent: 2001-109154 (2001-04-01), None
patent: 2001-215731 (2001-08-01), None
patent: 2002-525683 (2002-08-01), None
patent: 2002-260991 (2002-09-01), None
patent: 2003-76019 (2003-03-01), None
patent: 2003-122024 (2003-04-01), None
patent: 2003-195502 (2003-07-01), None
patent: 2003-249437 (2003-09-01), None
patent: 2003-270789 (2003-09-01), None
patent: 2004-061668 (2004-02-01), None
patent: 2004-514952 (2004-05-01), None
patent: 2004-527113 (2004-09-01), None
patent: 2004-310082 (2004-11-01), None
patent: 2005-109146 (2005-04-01), None
patent: 2005-533907 (2005-11-01), None
patent: 2006-072326 (2006-03-01), None
patent: 2006-156422 (2006-06-01), None
patent: 2006-227174 (2006-08-01), None
patent: 2006-518779 (2006-08-01), None
patent: 2006-259136 (2006-09-01), None
patent: 2006-303504 (2006-11-01), None
patent: 2006-309245 (2006-11-01), None
patent: 2007-025240 (2007-02-01), None
patent: 2007-065024 (2007-03-01), None
patent: 2007-071978 (2007-03-01), None
patent: 2007-108581 (2007-04-01), None
patent: 2007-140188 (2007-06-01), None
patent: 2007-156450 (2007-06-01), None
patent: 2008-522206 (2008-06-01), None
patent: 2008-292975 (2008-12-01), None
patent: 2008-310314 (2008-12-01), None
patent: 99/14635 (1999-03-01), None
patent: 00/17712 (2000-03-01), None
patent: 02/44845 (2002-06-01), None
patent: 2004/068242 (2004-08-01), None
patent: 2004/074937 (2004-09-01), None
patent: 2004/076495 (2004-09-01), None
patent: 2004/077158 (2004-09-01), None
patent: 2005/019937 (2005-03-01), None
patent: 2005/043239 (2005-05-01), None
patent: 2006/056905 (2006-06-01), None
patent: 2007/037213 (2007-04-01), None
patent: 2008 129964 (2008-10-01), None
patent: 2008 140119 (2008-11-01), None
Extended European Search Report dated May 28, 2009.
Submission of Publication dated Jun. 11, 2010, in Japanese Application No. 2007-325915.
Correspondence Record prepared Jul. 13, 2010, in Japanese Application No. 2007-325915.
Notification of Reasons for Refusal in counterpart Japanese Application No. 2007-325915, dated Mar. 30, 2010.
European Search Report, dated Sep. 20, 2010 issued in counterpart application No. 07025004.8.
Office Action dated Sep. 13, 2010 in copending U.S. Appl. No. 11/964,454.
Steven R.J. Brueck et al, “Extension of 193-nm immersion optical lithography to the 22-nm half-pitch node” Optical Microlithography XVII, Proceedings of SPIE vol. 5377, pp. 1315-1322 (2004).
M. Maenhoudt et al, “Double Patterning scheme for sub-0.25 k1 single damascene structures at NA=0.75, lamda = 193nm” Optical Microlithography XVIII, Proceedings of SPIE vol. 5754, pp. 1508-1518 (2005).
Sungkoo Lee, et al, “Double exposure technology using silicon containing materials” Advances in Resist Technology and Processing XXIII, Proc. of SPIE vol. 6153, pp. 61531K-1 to 61
Hoshino Wataru
Mizutani Kazuyoshi
Tarutani Shinji
Tsubaki Hideaki
Wada Kenji
Chu John S
FUJIFILM Corporation
Sughrue & Mion, PLLC
LandOfFree
Pattern forming method, resist composition to be used in the... does not yet have a rating. At this time, there are no reviews or comments for this patent.
If you have personal experience with Pattern forming method, resist composition to be used in the..., we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Pattern forming method, resist composition to be used in the... will most certainly appreciate the feedback.
Profile ID: LFUS-PAI-O-4258037