Pattern forming method including the formation of an acidic coat

Details Pattern forming method including the formation of an acidic coat Pattern forming method including the formation of an acidic coat

1992-12-09

1994-07-05

Bowers, Jr., Charles L.

Radiation imagery chemistry: process, composition, or product th

Imaging affecting physical property of radiation sensitive...

Forming nonplanar surface

430330, 430327, 430324, 430273, G03C 500

Patent

active

053266757

ABSTRACT:
A radiation-sensitive layer comprising as a main component a radiation-sensitive composition containing a compound capable of generating an acid when exposed to a chemical radiation and a compound having at least one linkage decomposable by an acid is formed on a substrate. An acidic coating layer is formed on the radiation-sensitive layer. The radiation-sensitive layer and the acidic coating layer are pattern-exposed to a chemical radiation. The radiation-sensitive layer and the acidic coating layer are baked and developed by using an aqueous alkaline solution to obtain a pattern comprising lines and spaces, each having a predetermined width. A fine pattern of a rectangular sectional shape can be formed without producing eaves caused by a surface inhibition layer layer, which is produced on the film surface.

REFERENCES:
patent: 5198326 (1993-03-01), Hashimoto et al.

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