Pattern forming method and substance adherence pattern material

Details Pattern forming method and substance adherence pattern material Pattern forming method and substance adherence pattern material

2003-12-16

2008-07-29

McPherson, John A. (Department: 1795)

Radiation imagery chemistry: process, composition, or product th

Imaging affecting physical property of radiation sensitive...

Forming nonplanar surface

C430S320000, C430S324000

Reexamination Certificate

active

07405035

ABSTRACT:
The present invention relates to a pattern forming method comprising image-wise forming, on a surface of a substrate, a region having an ability to initiate polymerization, forming a graft polymer on the region by atom transfer radical polymerization, and adhering a substance to the graft polymer. The method can be applied for preparing an image forming material, a fine particle adsorption pattern material, a conductive pattern material, or the like by selecting a suitable substance.

REFERENCES:
patent: 6919158 (2005-07-01), Kawamura et al.
patent: 0 809 282 (1997-11-01), None
Yoshinobu Tsujii et al.: “Fabrication of patterned high-density polymer graft surfaces. II. Amplification of EB-patterned initiator monolayer by surface-initiated atom transfer radical polymerization”, Polymer, Elsevier Science Publishers B.V, GB, vol. 43, No. 13, Jun. 2002, pp. 3837-3841, XP004349557.
Rahul R. Shah, et al., “Using atom transfer radical polymerization to amplify monolayers of initiators patterned by microcontact printing into polymer brushes for pattern transfer”, MACROMOLECULES, vol. 33, No. 2, Aug. 1, 2000, pp. 597-605, XP002273494.
Krzysztof Matyjaszewski, et al., “Atom transfer radical polymerization”, Chemical Reviews, American Chemical Society. Easton, US, vol. 101, No. 9, Dec. 9, 2001, pp. 2921-2990, XP002212148.
Younan Xia, et al., “Soft Lithography”, Angewandte Chemie. International Edition, Verlag Chemie. Weinheim, DE, vol. 37, 1998, pp. 550-575, XP002149045.

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