Pattern forming method and pattern forming apparatus using expos

Details Pattern forming method and pattern forming apparatus using expos Pattern forming method and pattern forming apparatus using expos

1981-09-18

1983-08-02

Schilling, Richard L.

Radiation imagery chemistry: process, composition, or product th

Imaging affecting physical property of radiation sensitive...

Forming nonplanar surface

430325, 430327, 430331, 430396, 354323, 354333, 355132, G03C 504, G03C 500, G03C 506, G03D 308

Patent

active

043967051

ABSTRACT:
A pattern forming method comprising a step of disposing a substrate with a coated film of photosensitive composition and a mask having a predetermined pattern in a first liquid which does not dissolve said coated film of photosensitive composition, and a step of exposing said coated film to light through said mask. An apparatus for attaining this method is also disclosed. The influence of dust can be readily avoided and an image with high resolution is obtained.

REFERENCES:
patent: 3434835 (1969-03-01), Gaynor et al.
patent: 3573975 (1971-04-01), Dhaka et al.
patent: 3664738 (1972-05-01), Cameron
patent: 3732120 (1973-03-01), Hummel

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