Pattern forming method and pattern forming apparatus using expos

Radiation imagery chemistry: process – composition – or product th – Imaging affecting physical property of radiation sensitive... – Forming nonplanar surface

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430325, 430327, 430331, 430396, 354323, 354333, 355132, G03C 504, G03C 500, G03C 506, G03D 308

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active

043967051

ABSTRACT:
A pattern forming method comprising a step of disposing a substrate with a coated film of photosensitive composition and a mask having a predetermined pattern in a first liquid which does not dissolve said coated film of photosensitive composition, and a step of exposing said coated film to light through said mask. An apparatus for attaining this method is also disclosed. The influence of dust can be readily avoided and an image with high resolution is obtained.

REFERENCES:
patent: 3434835 (1969-03-01), Gaynor et al.
patent: 3573975 (1971-04-01), Dhaka et al.
patent: 3664738 (1972-05-01), Cameron
patent: 3732120 (1973-03-01), Hummel

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