Pattern forming method

Radiation imagery chemistry: process – composition – or product th – Imaging affecting physical property of radiation sensitive... – Electron beam imaging

Patent

Rate now

  [ 0.00 ] – not rated yet Voters 0   Comments 0

Details

430313, 430318, B03C 500

Patent

active

060401141

ABSTRACT:
A method of forming a pattern for a semiconductor device comprises the steps of forming a photosensitive film on a substrate and radiating the photosensitive film on the substrate with a beam of a predetermined shape consisting of one of a charged particle beam and an electromagnetic beam, thereby forming an exposed region of a desired shape, the latter step including the step of exposing each of unit regions by a single shot of the beam of the predetermined shape for a predetermined period of time, repeating the exposure a plurality of times, and butt-joining the exposed unit regions to thereby form the exposed region of the desired shape, wherein, in the step of forming the exposed region of the desired shape, butting portions of the unit regions are situated in a first area of a layer to be formed other than a second area in the layer in which predetermined characteristics of a function of the semiconductor device are determined by a pattern width of the exposed region in association with another pattern formed in another layer.

REFERENCES:
patent: 4735881 (1988-04-01), Kobayashi et al.

LandOfFree

Say what you really think

Search LandOfFree.com for the USA inventors and patents. Rate them and share your experience with other people.

Rating

Pattern forming method does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Pattern forming method, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Pattern forming method will most certainly appreciate the feedback.

Rate now

     

Profile ID: LFUS-PAI-O-729161

  Search
All data on this website is collected from public sources. Our data reflects the most accurate information available at the time of publication.