Pattern forming method

Details Pattern forming method Pattern forming method

1988-12-30

1990-03-13

Schilling, Richard L.

Radiation imagery chemistry: process, composition, or product th

Imaging affecting physical property of radiation sensitive...

Forming nonplanar surface

430317, G03F 710, G03F 726

Patent

active

049082990

ABSTRACT:
A method of forming any film pattern on an arbitrary substrate, more particularly, a pattern forming method which comprises selectively forming a film on an arbitrary substrate, by use of chemical reaction, and further, a method of forming a pattern of an organic film by selectively removing the organic film at a lower layer, with the pattern of the Langmuir-Blodgett's film containing Si as a mask.

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patent: 4439516 (1984-03-01), Cernigliaro et al.
patent: 4507384 (1985-03-01), Morita et al.
patent: 4564572 (1986-01-01), Saigo et al.
patent: 4564576 (1986-01-01), Saigo et al.
patent: 4715929 (1987-12-01), Ogawa

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