Radiation imagery chemistry: process – composition – or product th – Imaging affecting physical property of radiation sensitive... – Forming nonplanar surface
Patent
1992-07-02
1993-11-16
McCamish, Marion E.
Radiation imagery chemistry: process, composition, or product th
Imaging affecting physical property of radiation sensitive...
Forming nonplanar surface
430313, 430314, 430322, 430324, 430325, 430329, 430330, G03F 726
Patent
active
052622827
ABSTRACT:
A pattern forming method of a resist to be used in the manufacturing process of a semiconductor device. The desired area of a resist film is made hydrophilic by an exposure and a mask material is precipitated and deposited on the area of resist film made hydrophilic in the solution. The patterning of resist film is thus carried out, and a pattern of high reliability is formed. After exposure, by silylizing or baking the resist film, a pattern of higher reliability is formed. Furthermore, after patterning of the resist film, the precipitation and deposition of the mask material are carried out again, and a reversed pattern of high reliability is formed by eliminating the resist film made with patterning by the lift-off process.
REFERENCES:
patent: 4751170 (1988-06-01), Mimura et al.
patent: 4999280 (1991-03-01), Hiraoka
Coopmans et al., "DESIRE: A Novel Dry Developed Resist System", 1986 SPIE, vol. 631, Advances in Resist Tech. and Processing III, pp. 34-39.
Hieda Katsuhiko
Higashikawa Iwao
Duda Kathleen
Kabushiki Kaisha Toshiba
McCamish Marion E.
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