Radiation imagery chemistry: process – composition – or product th – Imaging affecting physical property of radiation sensitive... – Forming nonplanar surface
Patent
1989-07-21
1993-01-12
McCamish, Marion E.
Radiation imagery chemistry: process, composition, or product th
Imaging affecting physical property of radiation sensitive...
Forming nonplanar surface
430324, 430325, 430428, 156625, 156643, 1566591, 156660, G03F 900, G03C 500
Patent
active
051789892
ABSTRACT:
Pattern forming and transferring processes using radiation sensitive materials based upon mixtures of polyoxometalates and organic compounds. The processes involve establishing a layer of such radiation sensitve material on one or more layers of underlying materials. A pattern is formed in the layer of radiation sensitive material by exposing selected areas of the layer to radiation. The pattern may then be transferred into the underlying layers of material. Methods for developing patterns in layers of radiation sensitive materials, so as to hinder leaching of etch resistant substances included in the radiation sensitive materials, are also provided.
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Argitis Panagiotis
Carls Joseph C.
Heller Adam
Meaux John J.
Board of Regents , The University of Texas System
Duda Kathleen
McCamish Marion E.
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