Pattern formation with negative type resist

Details Pattern formation with negative type resist Pattern formation with negative type resist

1983-08-08

1984-04-10

Brammer, Jack P.

Radiation imagery chemistry: process, composition, or product th

Imaging affecting physical property of radiation sensitive...

Forming nonplanar surface

430286, 430287, 430313, 20415922, G03C 500

Patent

active

044421990

ABSTRACT:
A pattern formation with a negative type resist comprises forming a thin film made of a resist on a board and irradiating light or radiation; developing and etching the product. The resist is a diene polymer obtained by a living polymerization in the presence of an organometallic compound or a cyclic polymer thereof.

REFERENCES:
patent: 3669662 (1972-06-01), Agnehoiri
patent: 3808155 (1974-04-01), Broyde
patent: 3894163 (1975-07-01), Broyde
patent: 4208211 (1980-06-01), Bowden

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