Pattern formation process

Details Pattern formation process Pattern formation process

1995-06-07

1997-09-23

Chu, John S.

Radiation imagery chemistry: process, composition, or product th

Imaging affecting physical property of radiation sensitive...

Forming nonplanar surface

430170, 4302701, 430330, 430907, 430909, 430942, G03F 730, G03F 7004

Patent

active

056702990

ABSTRACT:
A resist composition comprising (a) a polymer having at least repeating units of the formulae: ##STR1## (b) a photoacid generator and (c) a solvent, has high sensitivity to light, excellent heat resistance, adhesiveness to a substrate and suitable for pattern formation with high resolution.

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