Pattern-formation method with iodine containing azide and oxygen

Details Pattern-formation method with iodine containing azide and oxygen Pattern-formation method with iodine containing azide and oxygen

1982-07-13

1984-08-14

Bowers, Jr., Charles L.

Radiation imagery chemistry: process, composition, or product th

Imaging affecting physical property of radiation sensitive...

Electron beam imaging

430195, 430197, 430300, 430302, 430313, 430317, 430318, 430323, 430325, 430329, 430330, 430309, 430927, 430967, 156643, G03F 726, G03F 708, G03F 710, H01L 21308

Patent

active

044657684

ABSTRACT:
A radiation-sensitive composition comprising an iodine-containing azide compound at least a part of which can be fixed substantially in a polymer by exposure to a radiation and a polymer, or a radiation-sensitive composition comprising an azide compound, an iodine compound at least a part of which can be fixed substantially in a polymer by exposure to a radiation and a polymer. This composition can be subjected to the dry development with oxygen plasma after the exposure followed by heating.

REFERENCES:
patent: 3748135 (1977-07-01), Singh
patent: 3887379 (1975-06-01), Clecak et al.
patent: 3923522 (1975-12-01), Hata
patent: 3945830 (1976-03-01), Yazawa et al.
patent: 4019907 (1977-04-01), Tsunoda et al.
patent: 4388397 (1983-06-01), Kanai

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