Pattern formation method utilizing deep UV radiation and bisazid

Details Pattern formation method utilizing deep UV radiation and bisazid Pattern formation method utilizing deep UV radiation and bisazid

1983-04-14

1984-09-04

Bowers, Jr., Charles L.

Radiation imagery chemistry: process, composition, or product th

Imaging affecting physical property of radiation sensitive...

Forming nonplanar surface

430167, 430194, 430197, 430311, 430927, G03C 516, G03F 726

Patent

active

044697783

ABSTRACT:
Disclosed is a pattern formation method comprising exposing a photosensitive composition comprising a bisazide compound represented by the following general formula: ##STR1## wherein A stands for an atom or atomic group selected from O, S, CH.sub.2, CH.sub.2 CH.sub.2, SO.sub.2 and S.sub.2, X stands for an atom or atomic group selected from H and N.sub.3, and when X is H, Z is a group of N.sub.3 and when X is N.sub.3, Z is an atom of H or Cl, and a polymeric compound to deep UV rays, to form fine patterns.

REFERENCES:
patent: 2714066 (1955-07-01), Jewett et al.
patent: 2852379 (1958-09-01), Hepher et al.
patent: 2937085 (1960-05-01), Seven et al.
patent: 3046118 (1962-07-01), Schmidt
patent: 3287128 (1966-11-01), Lugasch
patent: 3767409 (1973-10-01), Grisdale et al.
patent: 4191573 (1980-03-01), Toyama et al.
patent: 4347300 (1982-08-01), Shimazu et al.
Iwayanagi et al., "Azide Photoresists for Deep U.V. Lithography", J. Electrochem. Soc., 12/1980, pp. 59-60.
Anon, "Kodak Photosensitive Resists for Industry", E. Kodak, First Ed., 1962, pp. 23-24.
De Forest, W. S., "Photoresist", McGraw-Hill Book Co., 1975, pp. 103-109.
Tsunoda et al., Photo Sci. & Eng., vol. 17, No. 4, 1973, pp. 390-393.

Affiliated with

Also associated with

Rating

Pattern formation method utilizing deep UV radiation and bisazid does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Pattern formation method utilizing deep UV radiation and bisazid, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Pattern formation method utilizing deep UV radiation and bisazid will most certainly appreciate the feedback.

Rate now

Comments { 0 }

Profile ID: LFUS-PAI-O-1892553