Radiation imagery chemistry: process – composition – or product th – Imaging affecting physical property of radiation sensitive... – Forming nonplanar surface
Patent
1995-11-29
1996-09-24
Chu, John S. Y.
Radiation imagery chemistry: process, composition, or product th
Imaging affecting physical property of radiation sensitive...
Forming nonplanar surface
430170, 4302701, 430330, 430909, G03F 732
Patent
active
055589766
ABSTRACT:
A resist material comprising (a) a terpolymer, (b) a photoacid generator, and (c) a solvent has high light sensitivity, heat resistance, adhesiveness, resolution, etc., and is suitable for forming a pattern of rectangular shape.
REFERENCES:
patent: 5332650 (1994-07-01), Murata et al.
patent: 5338641 (1994-08-01), Pawlowski et al.
patent: 5340682 (1994-08-01), Pawlowski et al.
patent: 5350660 (1994-09-01), Urano et al.
Derwent Publications Ltd., Class A89, AN 94-223190 & JP-A 06 161 112 Apr. 7, 1994 (Abstract).
Endo Masayuki
Katsuyama Akiko
Negishi Takaaki
Urano Fumiyoshi
Chu John S. Y.
Matsushita Electric - Industrial Co., Ltd.
Wako Pure Chemical Industries Ltd.
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