Pattern formation method

Radiation imagery chemistry: process – composition – or product th – Imaging affecting physical property of radiation sensitive... – Forming nonplanar surface

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430170, 4302701, 430330, 430909, G03F 732

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active

055589766

ABSTRACT:
A resist material comprising (a) a terpolymer, (b) a photoacid generator, and (c) a solvent has high light sensitivity, heat resistance, adhesiveness, resolution, etc., and is suitable for forming a pattern of rectangular shape.

REFERENCES:
patent: 5332650 (1994-07-01), Murata et al.
patent: 5338641 (1994-08-01), Pawlowski et al.
patent: 5340682 (1994-08-01), Pawlowski et al.
patent: 5350660 (1994-09-01), Urano et al.
Derwent Publications Ltd., Class A89, AN 94-223190 & JP-A 06 161 112 Apr. 7, 1994 (Abstract).

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