Pattern formation material and pattern formation method

Details Pattern formation material and pattern formation method Pattern formation material and pattern formation method

1994-03-07

1995-08-22

Powell, William

Radiation imagery chemistry: process, composition, or product th

Imaging affecting physical property of radiation sensitive...

Radiation sensitive composition or product or process of making

216 55, 216 48, 216 62, B44C 122, B29C 3700

Patent

active

054436907

ABSTRACT:
A pattern formation material capable of keeping dimensional accuracy of a pattern at a desired level even after a polymer is left standing for a long time after exposure and before baking, and a method of forming such a pattern formation material, which comprises a copolymer containing units containing a polycyclic aromatic ring, a condensed ring having at least one aromatic ring, or an aromatic ring having, as a substitution group, an alicyclic group, a branched alkyl or a halogen, and units from a monomer containing a photosensitive group, and a compound generating an acid by irradiation to ultraviolet rays.

REFERENCES:
patent: 4935094 (1990-06-01), Mixon et al.
patent: 5294297 (1994-03-01), Nishiura et al.

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