Electricity: electrical systems and devices – Electric charge generating or conducting means – Use of forces of electric charge or field
Reexamination Certificate
2011-08-16
2011-08-16
Fureman, Jared (Department: 2836)
Electricity: electrical systems and devices
Electric charge generating or conducting means
Use of forces of electric charge or field
C361S236000
Reexamination Certificate
active
08000080
ABSTRACT:
An apparatus and method for trapping particles in a housing is disclosed. A high voltage terminal/structure is situated within a housing. A conductive material, having a plurality of holes, such as a mesh, is disposed a distance away from an interior surface of the housing, such as the floor of the housing, forming a particle trap. The conductive mesh is biased so that the electrical field within the trap is either non-existent or pushing toward the floor, so as to retain particles within the trap. Additionally, a particle mover, such as a fan or mechanical vibration device, can be used to urge particles into the openings in the mesh. Furthermore, a conditioning phase may be used prior to operating the high voltage terminal, whereby a voltage is applied to the conductive mesh so as to attract particles toward the particle trap.
REFERENCES:
patent: 3237382 (1966-03-01), Berly
patent: 3515939 (1970-06-01), Trump
patent: 4327243 (1982-04-01), Hopkins et al.
patent: 5279723 (1994-01-01), Falabella et al.
patent: 5656092 (1997-08-01), Blake et al.
patent: 6307172 (2001-10-01), Bolin et al.
patent: 6451176 (2002-09-01), Vernon et al.
patent: 7262362 (2007-08-01), Holaus et al.
patent: 7547898 (2009-06-01), Berrian et al.
patent: 7547899 (2009-06-01), Vanderpot et al.
patent: 7566887 (2009-07-01), Huang et al.
patent: 7598495 (2009-10-01), Kellerman et al.
patent: 2007/0102652 (2007-05-01), Ring et al.
patent: 2005096099 (2005-10-01), None
Krause Stephen E.
Low Russell J.
Tekletsadik Kasegn D.
Fureman Jared
Thomas Lucy
Varian Semiconductor Equipment Associates Inc.
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