Particle detection on patterned wafers and the like

Optics: measuring and testing – By configuration comparison – With comparison to master – desired shape – or reference voltage

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356237, 356338, 356398, G01B 1100

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active

048984710

ABSTRACT:
A particle detection on a periodic patterned surface is achieved in a method and apparatus using a single light beam scanning at a shallow angle over the surface. The surface contains a plurality of identical die with streets between die. The beam scans parallel to a street direction, while a light collection system collects light scattered from the surface with a constant solid angle. The position of the collection system as well as the polarization of the light beam and collected scattered light may be arranged to maximize the particle signal compared to the pattern signal. A detector produces an electrical signal corresponding to the intensity of scattered light that is colelcted. A processor constructs templates from the electrical signal corresponding to individual die and compares the templates to identify particles. A reference template is constantly updated so that comparisons are between adjacent die. In one embodiment, the templates are made up of registered positions where the signal crosses a threshold, and the comparison is between corresponding positions to eliminate periodic pattern features, leaving only positions representing particles.

REFERENCES:
patent: 3909602 (1975-09-01), Micko
patent: 4402607 (1983-09-01), McVay et al.
patent: 4468120 (1984-08-01), Tanimoto et al.
patent: 4579455 (1986-09-01), Levy et al.
patent: 4614427 (1986-09-01), Koizumi et al.
patent: 4669875 (1987-06-01), Shiba et al.
Peter Gise, "Principles of Laser Scanning for Defect and Contamination Detection in Microfabrication", Solid State Technology, Nov. 1983, pp. 163-165.
Peter Gise, "Applications of Laser Scanning for Wafer and Photoplate Inspection", Microcontamination, Oct./Nov. 1983, pp. 41-44 and 62.
Barclay J. Tullis, "A Method of Measuring and Specifying Particle Contamination by Process Equipment", Microcontamination, Nov. 1985, pp. 67-73 and 160-161, Dec. 1985, pp. 15-21, and Jan. 1986, pp. 51-55 and 86, (3 parts).

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