Organometallic precursor mixture for forming metal alloy...

Radiation imagery chemistry: process – composition – or product th – Imaging affecting physical property of radiation sensitive... – Radiation sensitive composition or product or process of making

Reexamination Certificate

Rate now

  [ 0.00 ] – not rated yet Voters 0   Comments 0

Details

C427S376100, C427S383100, C106S001130, C106S001140, C106S287110

Reexamination Certificate

active

07014979

ABSTRACT:
An organometallic precursor mixture for forming a metal alloy pattern and a method of forming the metal alloy pattern using the same, wherein the metal alloy pattern having improved adhesive force to a substrate, heat resistance, and resistance to atmospheric corrosion can be readily formed using the organometallic precursor mixture by and exposing step without using a separate photosensitive resin.

REFERENCES:
patent: 5064685 (1991-11-01), Kestenbaum et al.
patent: 5387492 (1995-02-01), McCormick et al.
patent: 5514728 (1996-05-01), Lamanna et al.
patent: 5534312 (1996-07-01), Hill et al.
patent: 5856022 (1999-01-01), McCormick et al.
patent: 6348239 (2002-02-01), Hill et al.
patent: 62-263973 (1987-11-01), None
patent: 2001-221908 (2001-08-01), None
patent: 2001-226765 (2001-08-01), None
patent: 2003215792 (2003-07-01), None
patent: WO 02/40637 (2002-05-01), None

LandOfFree

Say what you really think

Search LandOfFree.com for the USA inventors and patents. Rate them and share your experience with other people.

Rating

Organometallic precursor mixture for forming metal alloy... does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Organometallic precursor mixture for forming metal alloy..., we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Organometallic precursor mixture for forming metal alloy... will most certainly appreciate the feedback.

Rate now

     

Profile ID: LFUS-PAI-O-3614303

  Search
All data on this website is collected from public sources. Our data reflects the most accurate information available at the time of publication.