Organic-metal precursor material and method of manufacturing...

Coating processes – Coating by vapor – gas – or smoke

Reexamination Certificate

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C427S569000, C556S136000, C556S137000

Reexamination Certificate

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07601392

ABSTRACT:
Provided are an organic-metal precursor material that can be readily decomposed without reacting with an oxidant, a method of manufacturing a metal thin film using the organic-metal precursor material, and a metal thin film prepared using the organic-metal precursor material. The organic-metal precursor material is an organic molecule having lone-pair electrons selected from the group consisting of ether, amine, tetrahydrofuran (THF), a phosphine group, and a phosphite group, and has a structure of covalent coordination bond.

REFERENCES:
patent: 2002/0074582 (2002-06-01), Hiratani et al.
patent: 2005/0085031 (2005-04-01), Lopatin et al.

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