Radiation imagery chemistry: process – composition – or product th – Imaging affecting physical property of radiation sensitive... – Forming nonplanar surface
Reexamination Certificate
2007-04-03
2007-04-03
Lee, Sin (Department: 1752)
Radiation imagery chemistry: process, composition, or product th
Imaging affecting physical property of radiation sensitive...
Forming nonplanar surface
C430S326000, C430S273100, C430S311000, C430S330000, C430S331000
Reexamination Certificate
active
10811558
ABSTRACT:
Disclosed are an organic anti-reflective coating polymer having a structure represented by the following formula I, its preparation method and an organic anti-reflective coating composition with respect to an ultra-fine pattern formation process of the photoresist for photolithography technique using ArF light source with a wavelength of 193 nm or VUV light source with a wavelength of 157 nm. An organic anti-reflective coating polymer capable of protecting a photoresist from amines in the atmosphere to minimize the post exposure delay effect after exposure to light and, at the same time, enhances notching status, such as, a pattern distortion caused by diffused reflection, and reducing reflection rate to minimize the swing effect.wherein m is an integer ranging from 5 to 5000.
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Machine-assisted English translation for JP8-29972 as provided by JPO.
Bok Cheol-kyu
Lee Geun-soo
Lee Won-wook
Moon Seung-chan
Shin Ki-soo
Lee Sin
Marshall & Gerstein & Borun LLP
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