Organic aluminum precursor and method of forming a metal...

Details Organic aluminum precursor and method of forming a metal... Organic aluminum precursor and method of forming a metal...

2006-09-20

2009-02-10

Fourson, George (Department: 2823)

Semiconductor device manufacturing: process

Coating with electrically or thermally conductive material

To form ohmic contact to semiconductive material

C438S585000, C438S597000, C257SE21170

Reexamination Certificate

active

07488684

ABSTRACT:
An organic aluminum precursor includes aluminum as a central metal, and borohydride and trimethylamine as ligands. In a method of forming an aluminum layer or wire, the organic aluminum presursor is introduced onto a substrate, and then thermally decomposed. The aluminum decomposed from the organic aluminum precursor is deposited on the substrate.

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John A Glass Jr., “Chemical Vapor Deposition Precursor Chemistry. Formation of Pure Aluminum, Alumina, and Aluminum Boride Thin Films from Boron-Containing Precursor Compounds by Chemical Vapor Deposition,” Chem. Mater. 1992, 4, 530-538.

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